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Materials Experiment and Analysis Database: X-ray diffraction measurements containing 16 files performed on plate containing Hf,V,Ar,O annealed at 550.0C to add O on 2016-04-05 from Run 20160405.112759
Soedarmadji, Edwin et al.
CaltechDATA · Papers
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x-ray-diffraction
caltech hte measurement, hf, o, v, x-ray diffraction, oxide
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