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Hollow cathode gas flow sputtering for development of titanium oxide and tungsten-doped titanium oxide thin films / Nivin Alktash ; Gutachter: Bernd Szyszka, Günter Bräuer, Ronald Plath ; Betreuer: Bernd Szyszka

Alktash, Nivin [Verfasser] et al.
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620 ingenieurwissenschaften und maschinenbau, 600 technik, 621
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