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Ultra-thin WS2 growth by ALD from bis(tert-butylimido)bis(dimethylamido)tungsten and 1,2-ethanedithiol and detailed surface mechanism

Z. Qoraiche et al.
HAL (France) · Papers · License: Open Access
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1, Layer electronics, 0, Lamellar structure, Annealing glass, Deposition geology, Atomic layer deposition, Tungsten
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Record · ID 1090644
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