arXiv (All)
open access
Mie-lithography: void-resonance-assisted femtosecond laser printing for deep-ultraviolet to near-infrared nano dispersion devices
Nanoscale control of optical dispersion is essential for applications ranging from miniaturized spectrometers to color printing, all of which demand broadband spectral tunability. However, the Kramers-Kronig relations impose a fundamental trade-off between dispersion and loss, strictly limiting the
Conceptio Open Archive
Analyze & explore related research in Conceptio
Connect this record directly into your research workflow or AI agent. Explore citations across open repositories, query full text, and export structured proof bundles.
This document is indexed with metadata only: full text is not available in the archive for this record. Open the official source ↗
Related documents
- Power scaling of an extreme ultraviolet light source for future lithography#477912
- First observation of the $γ$-ray beam production by the backward Compton scattering of reflected synchrotron radiation in the extreme ultraviolet range#1070753
- Fabrication of Si-based nanoimprint stamps with sub-20 nm features#275064
- Vertical quantum confinement in bulk MoS$_2$#985354
- Etirement d'implusions courtes avec des réseaux de Bragg fibres pour les chaines lasers de forte puissance#344442
Record · ID 1129206
Retrieved via Conceptio: every document is proof-bundled with source, license, and retrieval metadata.
Retrieved via Conceptio: every document is proof-bundled with source, license, and retrieval metadata.
Bring this data into your agent: Connect via MCP or API · 20 free credits to start · no card required
Read the Docs → · View CLI source on GitHub · Conceptio Open Knowledge Archive
Read the Docs → · View CLI source on GitHub · Conceptio Open Knowledge Archive