HAL (France)
open access
Thermal conductivity of AlN thin films deposited by reactive DC magnetron sputtering on different substrates using ultra-fast transient hot strip technique
In the frame of this work, we report a profound insight into the thermal conductivity (k) of aluminum nitride (AlN) thin films deposited on AlN-molecular beam epitaxy (MBE)/Si(111) and AlN-Kyma/Si(111) substrates at low temperatures (<200 °C) using reactive direct current magnetron sputte
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