HAL (France)
open access
Modification of the magnetic properties of PrScSi and NdScSi silicides induced by oxygen and hydrogen insertion via water vapor dissociation
Insertion of oxygen and hydrogen atoms into vacant octahedral and tetrahedral interstitial sites was observed after heating under air the silicides RScSi (R = rare-earth) in the temperature range 315-350 • C. In a previous study with R = La, this insertion was proposed to proceed
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