HAL (France)
open access
Multi-techniques characterisation of anti-reflective Ta2O5 and TaOxNy thin films deposited by reactive sputtering: coupling X-ray photoelectron spectroscopy, scanning/transmission electron microscopy and ion beam analysis
TaOxNy thin films were elaborated by reactive magnetron sputtering of a Ta target in an Ar/N2/O2 plasma mixture. These layers are intended to be used as antireflective coatings in systems for concentrated solar applications (operating temperature around 500 degrees C in air). The investigation of th
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