HAL (France)
open access
Influence of Al incorporation on the thermal stability, mechanical properties and oxidation behavior of (Ti,V,Zr,Nb,Hf,Ta)1-xAlxN thin films (x = 0, 0.1)
Conceptio Open Archive
Analyze & explore related research in Conceptio
Connect this record directly into your research workflow or AI agent. Explore citations across open repositories, query full text, and export structured proof bundles.
This document is indexed with metadata only: full text is not available in the archive for this record. Open the official source ↗
Related documents
- Mutually phase-stable tunable attosecond soft X-ray attosecond pulses from a free-electron laser#971858
- Structural and thermal characterization of AIN thin films and their integration in laser devices#1120276
- Theoretical study of structural and vibrational properties of Al3N3, Ga3N3, and In3N3#373882
- Growth, spectroscopy and 2 μm laser operation of monoclinic Tm3+:ZnWO4 crystal#1079381
- Boron-substituted aluminum clusters B(3)Al (n-3) (+/0/-) (n = 3-21): stability, halogen properties and ring current characters.#678519
Record · ID 129331
Retrieved via Conceptio: every document is proof-bundled with source, license, and retrieval metadata.
Retrieved via Conceptio: every document is proof-bundled with source, license, and retrieval metadata.
Bring this data into your agent: Connect via MCP or API · 20 free credits to start · no card required
Read the Docs → · View CLI source on GitHub · Conceptio Open Knowledge Archive
Read the Docs → · View CLI source on GitHub · Conceptio Open Knowledge Archive