HAL (France)
open access
Sub‐MHz homogeneous linewidth in epitaxial Y <sub>2</sub> O <sub>3</sub> : Eu <sup>3+</sup> thin film on silicon
Thin films provide nanoscale confinement together with compatibility with photonic and microwave architectures, making them ideal candidates for chip-scale quantum devices. In this work, we propose a thin film fabrication approach yielding the epitaxial growth of Eu 3+ doped Y 2 O 3 on silicon. We c
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