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Study of Schottky and Poole-Frenkel conduction mechanism in Fe304-gamma-Fe2O3/SiO2/n-type Si system

Ning Hann, Adrian Chung
UM Research Repository · Papers · License: CC BY-NC-ND 4.0
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electrical-and-computer-engineeringengineering-physicsengineering-science-and-materialsmaterials-science-and-engineering
The advances of metal oxide semiconductor technology (MOS) have led to smaller devices being made where sizes of the devices keep getting smaller and compact. Hence, all the components of metal oxide semiconductor sizes are to be reduced without affecting the overall efficiency of the metal oxide se
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