Conceptio › Archive › HAL (France)
HAL (France)open access

Effect of temperature on the growth of TiN thin films by oblique angle sputter-deposition: A three-dimensional atomistic computational study

Rubenson Mareus et al.
HAL (France) · Papers · License: Open Access
Open Source ↗
0, Monte Carlo simulations, Tilted columns, Angular distribution, TiN, Magnetron sputtering, GLAD
This document is indexed with metadata only — full text is not available in the archive for this record. Open the official source ↗
Record · ID 342197
Retrieved via Conceptio — every document is proof-bundled with source, license, and retrieval metadata.