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Influence of oxygen flow on the structure, chemical composition, and dielectric strength of AlxTayOz thin films deposited by pulsed-DC reactive magnetron sputtering
Ternary oxide, Reactive magnetron sputtering, 0, Dielectric strength, Tantalum, Reactive magnetron sputtering ternary oxide aluminum tantalum dielectric strength dielectric breakdown, Dielectric breakdown, Aluminum
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