HAL (France)
open access
Influence of oxygen flow on the structure, chemical composition, and dielectric strength of AlxTayOz thin films deposited by pulsed-DC reactive magnetron sputtering
Conceptio Open Archive
Analyze & explore related research in Conceptio
Connect this record directly into your research workflow or AI agent. Explore citations across open repositories, query full text, and export structured proof bundles.
This document is indexed with metadata only: full text is not available in the archive for this record. Open the official source ↗
Related documents
- Mgb2 Superconducting Thin Films Grown by Magnetron Sputtering#1027226
- Interface-related phenomena in epitaxial complex oxide ferroics across different thin film platforms: opportunities and challenges.#440219
- Impact of ar flow rates on micro-structural properties of ws2 thin film by rf magnetron sputtering#1068313
- Oxide dispersion strengthening of IN939 produced by selective laser melting#269378
- Oxygen-plasma-assisted epitaxial growth of tetragonal CuO(001) and CoxCu1-xO(001) thin films#1158260
Record · ID 350589
Retrieved via Conceptio: every document is proof-bundled with source, license, and retrieval metadata.
Retrieved via Conceptio: every document is proof-bundled with source, license, and retrieval metadata.
Bring this data into your agent: Connect via MCP or API · 20 free credits to start · no card required
Read the Docs → · View CLI source on GitHub · Conceptio Open Knowledge Archive
Read the Docs → · View CLI source on GitHub · Conceptio Open Knowledge Archive