HAL (France)open access
Développement de techniques de patterning avancées pour les filières CMOS-sub 10nm
CMOS, Spacer patterning, Techniques alternatives d’obtention des motifs, Atterning alternative techniques, DSA, 1, 0
This document is indexed with metadata only — full text is not available in the archive for this record.
Open the official source ↗
Record · ID 398803
Retrieved via
Conceptio — every document is proof-bundled with source, license, and retrieval metadata.