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Copper / low-k technological platform for the fabrication of high quality factor above-IC passive devices

Name: Copper / low-k technological platform for the fabrication of high quality factor above-IC passive devices
License: Open Access

Pisani, Marcelo Bento

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radio frequency micro electromechanical systems (rf mems), high quality rf passive devices, above-ic integration, copper / low k technology, rf passive modeling and characterization, systèmes microélectromécaniques pour la radio fréquence (rf mems), composants passifs à fort facteur de qualité, intégration "above-ic"

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Record · ID 460199
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