PART 413—ELECTROPLATING POINT SOURCE CATEGORY Authority: Secs. 301, 304(g), 307, 308, 309, 402, 405, 501(a), Clean Water Act, as amended, (33 U.S.C. 1311, 1314(g), 1317, 1318, 1319, 1322, 1325 and 1341(a)). Source: 46 FR 9467, Jan. 28, 1981, unless otherwise noted. General Provisions § 413.01 Applicability and compliance dates. (a) This part shall apply to electroplating operations in which metal is electroplated on any basis material and to related metal finishing operations as set forth in the various subparts, whether such operations are conducted in conjunction with electroplating, independently, or as part of some other operation. The compliance deadline for metals and cyanide at integrated facilities shall be June 30, 1984. The compliance date for metals and cyanide at non-integrated facilities shall be April 27, 1984. Compliance with TTO for all facilities shall be July 15, 1986. These part 413 standards shall not apply to a facility which must comply with all the pollutant limitations listed in § 433.15 (metal finishing PSES). (b) Operations similar to electroplating which are specifically excepted from coverage of this part include: (1) Electrowinning and electrorefining conducted as a part of nonferrous metal smelting and refining (40 CFR part 421); (2) Metal surface preparation and conversion coating conducted as a part of coil coating (40 CFR part 465); (3) Metal surface preparation and immersion plating or electroless plating conducted as a part of porcelain enameling (40 CFR part 466); and (4) Electrodeposition of active electrode materials, electroimpregnation, and electroforming conducted as a part of battery manufacturing (40 CFR part 461). (c) Metallic platemaking and gravure cylinder preparation conducted within or for printing and publishing facilities, and continuous strip electroplating conducted within iron and steel manufacturing facilities which introduce pollutants into a publicly owned treatment works are exempted from the pretreatment standards for existing sources set forth in this part. (Secs. 301, 304, 306, 307, 308, and 501 of the Clean Water Act (the Federal Water Pollution Control Act Amendments of 1972, 33 U.S.C. 1251 et. seq., [46 FR 9467, Jan. 28, 1981, as amended at 48 FR 32482, July 15, 1983; 48 FR 41410, Sept. 15, 1983; 51 FR 40421, Nov. 7, 1986] § 413.02 General definitions. In addition to the definitions set forth in 40 CFR part 401 and the chemical analysis methods set forth in 40 CFR part 136, both of which are incorporated herein by reference, the following definitions apply to this part: (a) The term CN,A (b) The term CN,T (c) The term Cr,VI (d) The term electroplating process wastewater (e) The term total metal (f) The term strong chelating agents (g) The term control authority (h) The term integrated facility (i) the term TTO Acenaphthene Acrolein Acrylonitrile Benzene Benzidine Carbon tetrachloride (tetrachloromethane) Chlorobenzene 1,2,4-trichlorobenzene Hexachlorobenzene 1,2-dichloroethane 1,1,1-trichloroethane Hexachloroethane 1,1-dichloroethane 1,1,2-trichloroethane 1,1,2,2-tetrachloroethane Chloroethane Bis (2-chloroethyl) ether 2-chloroethyl vinyl ether (mixed) 2-chloronaphthalene 2,4,6-trichlorophenol Parachlorometa cresol Chloroform (trichloromethane) 2-chlorophenol 1,2-dichlorobenzene 1,3-dichlorobenzene 1,4-dichlorobenzene 3,3-dichlorobenzidine 1,1-dichloroethylene 1,2-trans-dichloroethylene 2,4-dichlorophenol 1,2-dichloropropane 1,3-dichloropropylene (1,3-dichloropropene) 2,4-dimethylphenol 2,4-dinitrotoluene 2,6-dinitrotoluene 1,2-diphenylhydrazine Ethylbenzene Fluoranthene 4-chlorophenyl phenyl ether 4-bromophenyl phenyl ether Bis (2-chloroisopropyl) ether Bis (2-chloroethoxy) methane Methylene chloride (dichloromethane) Methyl chloride (chloromethane) Methyl bromide (bromomethane) Bromoform (tribromomethane) Dichlorobromomethane Chlorodibromomethane Hexachlorobutadiene Hexachlorocyclopentadiene Isophorone Naphthalene Nitrobenzene 2-nitrophenol 4-nitrophenol 2,4-dinitrophenol 4,6-dinitro-o-cresol N-nitrosodimethylamine N-nitrosodiphenylamine N-nitrosodi-n-propylamine Pentachlorophenol Phenol Bis (2-ethylhexyl) phthalate Butyl benzyl phthalate Di-n-butyl phthalate Di-n-octyl phthalate Diethyl phthalate Dimethyl phthalate 1,2-benzanthracene (benzo(a)anthracene) Benzo(a)pyrene (3,4-benzopyrene) 3,4-Benzofluoranthene (benzo(b)fluoranthene) 11,12-benzofluoranthene (benzo(k)fluoranthene) Chrysene Acenaphthylene Anthracene 1,12-benzoperylene (benzo(ghi)perylene) Fluorene Phenanthrene 1,2,5,6-dibenzanthracene (dibenzo(a,h)anthracene) Indeno (1,2,3-cd) pyrene) (2,3-o-phenylene pyrene) Pyrene Tetrachloroethylene Toluene Trichloroethylene Vinyl chloride (chloroethylene) Aldrin Dieldrin Chlordane (technical mixture and metabolites) 4,4-DDT 4,4-DDE (p,p-DDX) 4,4-DDD (p,p-TDE) Alpha-endosulfan Beta-endosulfan Endosulfan sulfate Endrin Endrin aldehyde Heptachlor Heptachlor epoxide (BHC-hexachlorocyclohexane) Alpha-BHC Beta-BHC Gamma-BHC Delta-BHC (PCB-polychlorinated biphenyls) PCB-1242 (Arochlor 1242) PCB-1254 (Arochlor 1254) PCB-1221 (Arochlor 1221) PCB-1232 (Arochlor 1232) PCB-1248 (Arochlor 1248) PCB-1260 (Arochlor 1260) PCB-1016 (Arochlor 1016) Toxaphene 2,3,7,8-tetrachlorodibenzo- p-dioxin (TCDD) (Secs. 301, 304, 306, 307, 308, and 501 of the Clean Water Act (the Federal Water Pollution Control Act Amendments of 1972, 33 U.S.C. 1251 et. seq., [46 FR 9467, Jan. 28, 1981, as amended at 48 FR 32483, July 15, 1983; 48 FR 43681, Sept. 26, 1983; 51 FR 40421, Nov. 7, 1986] § 413.03 Monitoring requirements. (a) In lieu of monitoring for TTO, the control authority may allow industrial users of POTWs to make the following certification as a comment to the periodic reports required by § 403.12(e): “Based on my inquiry of the person or persons directly responsible for managing compliance with the pretreatment standard for total toxic organics (TTO), I certify that, to the best of my knowledge and belief, no dumping of concentrated toxic organics into the wastewaters has occurred since filing the last discharge monitoring report. I further certify that this facility is implementing the toxic organic management plan submitted to the control authority.” (b) In requesting that no monitoring be required industrial users of POTWs shall submit a toxic organic management plan that specifies to the control authority's satisfaction the toxic organic compounds used; the method of disposal used instead of dumping, such as reclamation, contract hauling, or incineration; and procedures for assuring that toxic organics do not routinely spill or leak into the wastewater. (c) If monitoring is necessary to measure compliance with the TTO standard the industrial user need analyze only for those pollutants which would reasonably be expected to be present. (Approved by the Office of Management and Budget under control number 2040-0074) (Secs. 301, 304, 306, 307, 308, and 501 of the Clean Water Act (the Federal Water Pollution Control Act Amendments of 1972, 33 U.S.C. 1251 et. seq., [48 FR 32483, July 15, 1983; 48 FR 43681, Sept. 26, 1983, as amended at 49 FR 34823, Sept. 4, 1984] § 413.04 Standards for integrated facilities. Pretreatment standards for integrated facilities shall be computed as required by § 403.6(e) of EPA's General Pretreatment Regulations. In cases where electroplating process wastewaters are combined with regulated wastewaters which have 30 days average standards, the corresponding 30 day average standard for the electroplating wastewaters must be used. The 30 day average shall be determined for pollutants in the relevant subcategory from the corresponding daily and 4 day average values listed in the table below. If the maximum for any 1 day is And the 4 day average is Then the 30 day average is 0.6 0.4 0.3 1.2 .7 .5 1.9 1 .55 4.1 2.6 1.8 4.2 2.6 1.8 4.5 2.7 1.8 5.0 2.7 1.5 7.0 4 2.5 10.5 6.8 5 20.0 13.4 10 23 16 12 47 29 20 53 36 27 74 39 21 107 65 45 169 89 49 160 100 70 164 102 70 176 105 70 273 156 98 365 229 160 374 232 160 401 241 160 410 267 195 623 257 223 935 609 445 Subpart A—Electroplating of Common Metals Subcategory § 413.10 Applicability: Description of the electroplating of common metals subcategory. The provisions of this subpart apply to dischargers of pollutants in process wastewaters resulting from the process in which a ferrous or nonferrous basis material is electroplated with copper, nickel, chromium, zinc, tin, lead, cadmium, iron, aluminum, or any combination thereof. § 413.11 Specialized definitions. For the purpose of this subpart: (a) The term sq m (b) The term operation §§ 413.12-413.13 [Reserved] § 413.14 Pretreatment standards for existing sources. Except as provided in §§ 403.7 and 403.13 of this title, any existing source subject to this subpart which introduces pollutants into a publicly owned treatment works must comply with 40 CFR part 403 and achieve the following pretreatment standards for existing sources (PSES): (a) No user introducing wastewater pollutants into a publicly owned treatment works under the provisions of this subpart shall augment the use of process wastewater or otherwise dilute the wastewater as a partial or total substitute for adequate treatment to achieve compliance with this standard. (b) For a source discharging less than 38,000 liters (10,000 gal.) per calendar day of electroplating process wastewater the following limitations shall apply: Subpart A—Common Metals Facilities Discharging Less Than 38,000 Liters Per Day PSES Limitations (mg/l) Pollutant or pollutant property Maximum for any 1 day Average of daily values for 4 consecutive monitoring days shall not exceed CN, A 5.0 2.7 Pb .6 .4 Cd 1.2 .7 (c) For plants discharging 38,000 liters (10,000 gal) or more per calendar day of electroplating process wastewater the following limitations shall apply: Subpart A—Common Metals Facilities Discharging 38,000 Liters or More Per Day PSES Limitations (mg/l) Pollutant or pollutant property Maximum for any 1 day Average of daily values for 4 consecutive monitoring days shall not exceed CN, T 1.9 1.0 Cu 4.5 2.7 Ni 4.1 2.6 Cr 7.0 4.0 Zn 4.2 2.6 Pb .6 .4 Cd 1.2 .7 Total metals 10.5 6.8 (d) Alternatively, the following mass-based standards are equivalent to and may be applied in place of those limitations specified under paragraph (c) of this section upon prior agreement between a source subject to these standards and the publicly owned treatment works receiving such regulated wastes: Subpart A—Common Metals Facilities Discharging 38,000 Liters or More Per Day PSES Limitations (mg/sq m-Operation) Pollutant or pollutant property Maximum for any 1 day Average of daily values for 4 consecutive monitoring days shall not exceed CN, T 74 39 Cu 176 105 Ni 160 100 Cr 273 156 Zn 164 102 Pb 23 16 Cd 47 29 Total metals 410 267 (e) For wastewater sources regulated under paragraph (c) of this section, the following optional control program may be elected by the source introducing treated process wastewater into a publicly owned treatment works with the concurrence of the control authority. These optional pollutant parameters are not eligible for allowance for removal achieved by the publicly owned treatment works under 40 CFR 403.7. In the absence of strong chelating agents, after reduction of hexavalent chromium wastes, and after neutralization using calcium oxide (or hydroxide) the following limitations shall apply: Subpart A—Common Metals Facilities Discharging 38,000 Liters or More Per Day PSES Limitations (mg/l) Pollutant or pollutant property Maximum for any 1 day Average of daily values for 4 consecutive monitoring days shall not exceed CN, T 1.9 1.0 Pb .6 .4 Cd 1.2 .7 TSS 20.0 13.4 pH 1 1 1 (f) In addition to paragraphs (a) and (b) the following limitation shall apply for plants discharging less than 38,000 l (10,000 gal) per calendar day of electroplating process wastewater: Pollutant or pollutant property Maximum for any 1 day Milligrams per liter (mg/l) TTO 4.57 (g) In addition to paragraphs (a), (c), (d), and (e) the following limitation shall apply for plants discharging 38,000 1 (10,000 gal) or more per calendar day of electroplating process wastewater: Pollutant or pollutant property Maximum for any 1 day Milligrams per liter (mg/l) TTO 2.13 (h) In addition to paragraphs (a), (b), (c), (d), (e), (f), and (g) the following shall apply: An existing source submitting a certification in lieu of monitoring pursuant to § 413.03 of this regulation must implement the toxic organic management plan approved by the control authority. (Secs. 301, 304, 306, 307, 308, and 501 of the Clean Water Act (the Federal Water Pollution Control Act Amendments of 1972, 33 U.S.C. 1251 et. seq., [46 FR 9467, Jan. 28, 1981; 46 FR 30626, June 10, 1981, as amended at 48 FR 32483, July 15, 1983; 48 FR 43681, Sept. 26, 1983] Subpart B—Electroplating of Precious Metals Subcategory § 413.20 Applicability: Description of the electroplating of precious metals subcategory. The provisions of this subpart apply to discharges of process wastewaters resulting from the process in which a ferrous or nonferrous basis material is plated with gold, silver, iridium, palladium, platinum, rhodium, rutheniun, or any combination of these. § 413.21 Specialized definitions. For the purpose of this subpart: (a) The term sq m (b) The term operation §§ 413.22-413.23 [Reserved] § 413.24 Pretreatment standards for existing sources. Except as provided in 40 CFR §§ 403.7 and 403.13, any existing source subject to this subpart which introduces pollutants into a publicly owned treatment works must comply with 40 CFR part 403 and achieve the following pretreatment standards for existing sources (PSES): (a) No user introducing wastewater pollutants into a publicly owned treatment works under the provisions of this subpart shall augment the use of process wastewater or otherwise dilute the wastewater as a partial or total substitute for adequate treatment to achieve compliance with this standard. (b) For a source discharging less than 38,000 liters (10,000 gal) per calendar day of electroplating process wastewater the following limitations shall apply: Subpart B—Precious Metals Facilities Discharging Less Than 38,000 Liters Per Day PSES Limitations (mg/l) Pollutant or pollutant property Maximum for any 1 day Average of daily values for 4 consecutive monitoring days shall not exceed CN, A 5.0 2.7 Pb .6 .4 Cd 1.2 .7 (c) For plants discharging 38,000 liters (10,000 gal) or more per calendar day of electroplating process wastewater the following limitations shall apply: Subpart B—Precious Metals Facilities Discharging 38,000 Liters or More Per Day PSES Limitations (mg/l) Pollutant or pollutant property Maximum for any 1 day Average of daily values for 4 consecutive monitoring days shall not exceed Ag 1.2 0.7 CN, T 1.9 1.0 Cu 4.5 2.7 Ni 4.1 2.6 Cr 7.0 4.0 Zn 4.2 2.6 Pb .6 .4 Cd 1.2 .7 Total metals 10.5 6.8 (d) Alternatively, the following mass-based standards are equivalent to and may apply in place of those limitations specified under paragraph (c) of this section upon prior agreement between a source subject to these standards and the publicly owned treatment works receiving such regulated wastes: Subpart B—Precious Metals Facilities Discharging 38,000 Liters or More Per Day PSES Limitations (mg/sq m-Operation) Pollutant or pollutant property Maximum for any 1 day Average of daily values for 4 consecutive monitoring days shall not exceed Ag 47 29 CN, T 74 39 Cu 176 105 Ni 160 100 Cr 273 156 Zn 164 102 Pb 23 16 Cd 47 29 Total metals 410 267 (e) For wastewater sources regulated under paragraph (c) of this section, the following optional control program may be elected by the source introducing treated process wastewater into a publicly owned treatment works with the concurrence of the control authority. These optional pollutant parameters are not eligible for allowance for removal achieved by the publicly owned treatment works under 40 CFR 403.7. In the absence of strong chelating agents, after reduction of hexavalent chromium wastes, and after neutralization using calcium oxide (or hydroxide) the following limitations shall apply: Subpart B—Precious Metals Facilities Discharging 38,000 Liters or More Per Day PSES Limitations (mg/l) Pollutant or pollutant property Maximum for any 1 day Average of daily values for 4 consecutive monitoring days shall not exceed CN, T 1.9 1.0 Pb .6 .4 Cd 1.2 .7 TSS 20.0 13.4 pH 1 1 1 (f) In addition to paragraphs (a) and (b) the following limitation shall apply for plants discharging less than 38,000 l (10,000 gal) per calendar day of electroplating process wastewater: Pollutant or pollutant property Maximum for any 1 day Milligrams per liter (mg/l) TTO 4.57 (g) In addition to paragraphs (a), (c), (d), and (e) the following limitation shall apply for plants discharging 38,000 l (10,000 gal) or more per calendar day of electroplating process wastewater: Pollutant or pollutant property Maximum for any 1 day Milligrams per liter (mg/l) TTO 2.13 (h) In addition to paragraphs (a), (b), (c), (d), (e), (f), and (g) the following shall apply: An existing source submitting a certification in lieu of monitoring pursuant to § 413.03 of this regulation must implement the toxic organic management plan approved by the control authority. (Secs. 301, 304, 306, 307, 308, and 501 of the Clean Water Act (the Federal Water Pollution Control Act Amendments of 1972, 33 U.S.C. 1251 et. seq., [46 FR 9467, Jan. 28, 1981, as amended at 48 FR 32484, July 15, 1983; 48 FR 43681, Sept. 26, 1983] Subpart C—Electroplating of Speciality Metals Subcategory [Reserved] Subpart D—Anodizing Subcategory § 413.40 Applicability: Description of the anodizing subcategory. The provisions of this subpart apply to discharges of process wastewater resulting from the anodizing of ferrous or nonferrous materials. § 413.41 Specialized definitions. For the purpose of this subpart: (a) The term sq m (b) The term operation §§ 413.42-413.43 [Reserved] § 413.44 Pretreatment standards for existing sources. Except as provided in 40 CFR 403.7 and 403.13, any existing source subject to this subpart which introduces pollutants into a publicly owned treatment works must comply with 40 CFR part 403 and achieve the following pretreatment standards for existing sources (PSES): (a) No user introducing wastewater pollutants into a publicly owned treatment works under the provisions of this subpart shall augment the use of process wastewater or otherwise dilute the wastewater as a partial or total substitute for adequate treatment to achieve compliance with this standard. (b) For a source discharging less than 38,000 liters (10,000 gal) per calendar day of electroplating process wastewater the following limitations shall apply: Subpart D—Anodizing Facilities Discharging Less Than 38,000 Liters Per Day PSES Limitations (mg/l) Pollutant or pollutant property Maximum for any 1 day Average of daily values for 4 consecutive monitoring days shall not exceed CN, A 5.0 2.7 Pb 0.6 0.4 Cd 1.2 0.7 (c) For plants discharging 38,000 liters (10,000 gal) or more per calendar day of electroplating process wastewater the following limitations shall apply: Subpart D—Anodizing Facilities Discharging 38,000 Liters or More Per Day PSES Limitations (mg/l) Pollutant or pollutant property Maximum for any 1 day Average of daily values for 4 consecutive monitoring days shall not exceed CN, T 1.9 1.0 Cu 4.5 2.7 Ni 4.1 2.6 Cr 7.0 4.0 Zn 4.2 2.6 Pb 0.6 0.4 Cd 1.2 0.7 Total metals 10.5 6.8 (d) Alternatively, the following mass-based standards are equivalent to and may apply in place of those limitations specified under paragraph (c) of this section upon prior agreement between a source subject to these standards and the publicly owned treatment works receiving such regulated wastes: Subpart D—Anodizing Facilities Discharging 38,000 Liters or More Per Day PSES Limitations (mg/sq m-operation) Pollutant or pollutant property Maximum for any 1 day Average of daily values for 4 consecutive monitoring days shall not exceed CN, T 74 39 Cu 176 105 Ni 160 100 Cr 273 156 Zn 164 102 Pb 23 16 Cd 47 29 Total metals 410 267 (e) For wastewater sources regulated under paragraph (c) of this section, the following optional control program may be elected by the source introducing treated process wastewater into a publicly owned treatment works with the concurrence of the control authority. These optional pollutant parameters are not eligible for allowance for removal achieved by the publicly owned treatment works under 40 CFR 403.7. In the absence of strong chelating agents, after reduction of hexavalent chromium wastes, and after neutralization using calcium oxide (or hydroxide) the following limitations shall apply: Subpart D—Anodizing Facilities Discharging 38,000 Liters or More Per Day PSES Limitations (mg/l) Pollutant or pollutant property Maximum for any 1 day Average of daily values for 4 consecutive monitoring days shall not exceed CN,T 1.9 1.0 Pb 0.6 0.4 Cd 1.2 0.7 TSS 20.0 13.4 pH ( 1 ( 1 1 (f) In addition to paragraphs (a) and (b) the following limitation shall apply for plants discharging less than 38,000 l (10,000 gal) per calendar day of electroplating process wastewater: Pollutant or pollutant property Maximum for any 1 day Milligrams per liter (mg/l) TTO 4.57 (g) In addition to paragraphs (a), (c), (d), and (e) the following limitation shall apply for plants discharging 38,000 l (10,000 gal) or more per calendar day of electroplating process wastewater: Pollutant or pollutant property Maximum for any 1 day Milligrams per liter (mg/l) TTO 2.13 (h) In addition to paragraphs (a), (b), (c), (d), (e), (f), and (g) the following shall apply: An existing source submitting a certification in lieu of monitoring pursuant to § 413.03 of this regulation must implement the toxic organic management plan approved by the control authority. (Secs. 301, 304, 306, 307, 308, and 501 of the Clean Water Act (the Federal Water Pollution Control Act Amendments of 1972, 33 U.S.C. 1251 et. seq., [46 FR 9467, Jan. 28, 1981, as amended at 48 FR 32484, July 15, 1983; 48 FR 43681, Sept. 26, 1983] Subpart E—Coatings Subcategory § 413.50 Applicability: Description of the coatings subcategory. The provisions of this subpart apply to discharges resulting from the chromating, phosphating or immersion plating on ferrous or nonferrous materials. § 413.51 Specialized definitions. For the purpose of this subpart; (a) The term sq m (b) The term operation §§ 413.52-413.53 [Reserved] § 413.54 Pretreatment standards for existing sources. Except as provided in 40 CFR 403.7 and 403.13, any existing source subject to this subpart which introduces pollutants into a publicly owned treatment works must comply with 40 CFR part 403 and achieve the following pretreatment standards for existing sources (PSES): (a) No user introducing wastewater pollutants into a publicly owned treatment works under the provisions of this subpart shall augment the use of process wastewater or otherwise dilute the wastewater as a partial or total substitute for adequate treatment to achieve compliance with this standard. (b) For a source discharging less than 38,000 liters (10,000 gal) per calendar day of electroplating process wastewater the following limitations shall apply: Subpart E—Coatings Facilities Discharging Less Than 38,000 Liters Per Day PSES Limitations (mg/l) Pollutant or pollutant property Maximum for any 1 day Average of daily values for 4 consecutive monitoring days shall not exceed CN, A 5.0 2.7 Pb 0.6 0.4 Cd 1.2 0.7 (c) For plants discharging 38,000 liters (10,000 gal) or more per calendar day of electroplating process wastewater the following limitations shall apply: Subpart E—Coatings Facilities Discharging 38,000 Liters or More Per Day PSES Limitations (mg/l) Pollutant or pollutant property Maximum for any 1 day Average of daily values for 4 consecutive monitoring days shall not exceed CN,T 1.9 1.0 Cu 4.5 2.7 Ni 4.1 2.6 Cr 7.0 4.0 Zn 4.2 2.6 Pb 0.6 0.4 Cd 1.2 0.7 Total metals 10.5 6.8 (d) Alternatively, the following mass-based standards are equivalent to and may apply in place of those limitations specified under paragraph (c) of this section upon prior agreement between a source subject to these standards and the publicly owned treatment works receiving such regulated wastes: Subpart E—Coatings Facilities Discharging 38,000 Liters or More Per Day PSES Limitations (mg/sq m-operation) Pollutant or pollutant property Maximum for any 1 day Average of daily values for 4 consecutive monitoring days shall not exceed CN, T 74 39 Cu 176 105 Ni 160 100 Cr 273 156 Zn 164 102 Pb 23 16 Cd 47 29 Total metals 410 267 (e) For wastewater sources regulated under paragraph (c) of this section, the following optional control program may be elected by the source introducing treated process wastewater into a publicly owned treatment works with the concurrence of the control authority. These optional pollutant parameters are not eligible for allowance for removal achieved by the publicly owned treatment works under 40 CFR 403.7. In the absence of strong chelating agents, after reduction of hexavalent chromium wastes, and after neutralization using calcium oxide (or hydroxide) the following limitations shall apply: Subpart E—Coatings Facilities Discharging 38,000 Liters or More Per Day PSES Limitations (mg/l) Pollutant or pollutant property Maximum for any 1 day Average of daily values for 4 consecutive monitoring days shall not exceed CN, T 1.9 1.0 Pb 0.6 0.4 Cd 1.2 0.7 TSS 20.0 13.4 pH ( 1 ( 1 1 (f) In addition to paragraphs (a) and (b) of this section, the following limitation shall apply for plants discharging less than 38,000 l (10,000 gal) per calendar day of electroplating process wastewater: Pollutant or pollutant property Maximum for any 1 day Milligrams per liter (mg/l) TTO 4.57 (g) In addition to paragraphs (a), (c), (d), and (e) of this section, the following limitation shall apply for plants discharging 38,000 l (10,000 gal) or more per calendar day of electroplating process waterwater: Pollutant or pollutant property Maximum for any 1 day Milligrams per liter (mg/l) TTO 2.13 (h) In addition to paragraphs (a), (b), (c), (d), (e), (f), and (g) of this section, the following shall apply: An existing source submitting a certification in lieu of monitoring pursuant to § 413.03 of this regulation must implement the toxic organic management plan approved by the control authority. (Secs. 301, 304, 306, 307, 308, and 501 of the Clean Water Act (the Federal Water Pollution Control Act Amendments of 1972, 33 U.S.C. 1251 et. seq., [46 FR 9467, Jan. 28, 1981, as amended at 48 FR 32484, July 15, 1983; 48 FR 43681, Sept. 26, 1983] Subpart F—Chemical Etching and Milling Subcategory § 413.60 Applicability: Description of the chemical etching and milling subcategory. The provisions of this subpart apply to discharges of process wastewaters resulting from the chemical milling or etching of ferrous or nonferrous materials. § 413.61 Specialized definitions. For the purpose of this subpart: (a) The term sq m (b) The term operation §§ 413.62-413.63 [Reserved] § 413.64 Pretreatment standards for existing sources. Except as provided in 40 CFR 403.7 and 403.13, any existing source subject to this subpart which introduces pollutants into a publicly owned treatment works must comply with 40 CFR part 403 and achieve the following pretreatment standards for existing sources (PSES): (a) No User introducing wastewater pollutants into publicly owned treatment works under the provisions of this subpart shall augment the use of process wastewater or otherwise dilute the wastewater as a partial or total substitute for adequate treatment to achieve compliance with this standard. (b) For a source discharging less than 38,000 liters (10,000 gal.) per calendar day of electroplating process wastewater the following limitations shall apply: Subpart F—Chemical Etching and Milling Facilities Discharging Less Than 38,000 Liters Per Day PSES Limitations (mg/l) Pollutant or pollutant property Maximum for any 1 day Average of daily values for 4 consecutive monitoring days shall not exceed CN, A 5.0 2.7 Pb 0.6 0.4 Cd 1.2 0.7 (c) For plants discharging 38,000 liters (10,000 gal.) or more per calendar day of electroplating process wastewater the following limitations shall apply: Subpart F—Chemicals Etching and Milling Facilities Discharging 38,000 Liters or More Per Day PSES Limitations (mg/l) Pollutant or pollutant property Maximum for any 1 day Average of daily values for 4 consecutive monitoring days shall not exceed CN, T 1.9 1.0 Cu 4.5 2.7 Ni 4.1 2.6 Cr 7.0 4.0 Zn 4.2 2.6 Pb 0.6 0.4 Cd 1.2 0.7 Total metals 10.5 6.8 (d) Alternatively, the following mass-based standards are equivalent to and may apply in place of those limitations specified under paragraph (c) of this section upon prior agreement between a source subject to these standards and the publicly owned treatment works receiving such regulated wastes: Subpart F—Chemical Etching and Milling Facilities Discharging 38,000 Liters or More Per Day PSES Limitations (mg/sq m-operation) Pollutant or pollutant property Maximum for any 1 day Average of daily values for 4 consecutive monitoring days shall not exceed CN, T 74 39 Cu 176 105 Ni 160 100 Cr 273 156 Zn 164 102 Pb 23 16 Cd 47 29 Total metals 410 267 (e) For wastewater sources regulated under paragraph (c) of this section, the following optional control program may be elected by the source introducing treated process wastewater into a publicly owned treatment works with the concurrence of the control authority. These optional pollutant parameters are not eligible for allowance for removal achieved by the publicly owned treatment works under 40 CFR 403.7. In the absence of strong chelating agents, after reduction of hexavalent chromium wastes, and after neutralization using calcium oxide (or hydroxide) the following limitations shall apply: Subpart F—Chemical Etching and Milling Facilities Discharging 38,000 Liters or More Per Day PSES Limitations (mg/l) Pollutant or pollutant property Maximum for any 1 day Average of daily values for 4 consecutive monitoring days shall not exceed CN, T 1.9 1.0 Pb 0.6 0.4 Cd 1.2 0.7 TSS 20.0 13.4 pH ( 1 ( 1 1 (f) In addition to paragraphs (a) and (b) of this section, the following limitation shall apply for plants discharging less than 38,000 l (10,000 gal) per calendar day of electroplating process wastewater: Pollutant or pollutant property Maximum for any 1 day Milligrams per liter (mg/l) TTO 4.57 (g) In addition to paragraphs (a), (c), (d), and (e) of this section, the following limitation shall apply for plants discharging 38,000 l (10,000 gal) or more per calendar day of electroplating process wastewater: Pollutant or pollutant property Maximum for any 1 day Milligrams per liter (mg/l) TTO 2.13 (h) In addition to paragraphs (a), (b), (c), (d), (e), (f), and (g) of this section, the following shall apply: An existing source submitting a certification in lieu of monitoring pursuant to § 413.03 of this regulation must implement the toxic organic management plan approved by the control authority. (Secs. 301, 304, 306, 307, 308, and 501 of the Clean Water Act (the Federal Water Pollution Control Act Amendments of 1972, 33 U.S.C. 1251 et. seq., [46 FR 9467, Jan. 28, 1981, as amended at 48 FR 32484, July 15, 1983; 48 FR 43681, Sept. 26, 1983] Subpart G—Electroless Plating Subcategory § 413.70 Applicability: Description of the electroless plating subcategory. The provisions of this subpart apply to discharges resulting from the electroless plating of a metallic layer on a metallic or nonmetallic substrate. § 413.71 Specialized definitions. For the purpose of this subpart: (a) The term sq m (b) The term electroless plating (c) The term operation §§ 413.72-413.73 [Reserved] § 413.74 Pretreatment standards for existing sources. Except as provided in 40 CFR 403.7 and 403.13, any existing source subject to this subpart which introduces pollutants into a publicly owned treatment works must comply with 40 CFR part 403 and achieve the following pretreatment standards for existing sources (PSES): (a) No User introducing wastewater pollutants into publicly owned treatment works under the provisions of this subpart shall augment the use of process wastewater or otherwise dilute the wastewater as a partial or total substitute for adequate treatment to achieve compliance with this standard. (b) For a source discharging less than 38,000 liters (10,000 gal.) per calendar day of electroplating process wastewater the following limitations shall apply: Subpart G—Electroless Plating Facilities Discharging Less Than 38,000 Liters Per Day PSES Limitations (mg/l) Pollutant or pollutant property Maximum for any 1 day Average of daily values for 4 consecutive monitoring days shall not exceed CN,A 5.0 2.7 Pb 0.6 0.4 Cd 1.2 0.7 (c) For plants discharging 38,000 l (10,000 gal) or more per calendar day of electroplating process wastewater the following limitations shall apply: Subpart G—Electroless Plating Facilities Discharging 38,000 Liters or More Per Day PSES Limitations (mg/l) Pollutant or pollutant property Maximum for any 1 day Average of daily values for 4 consecutive monitoring days shall not exceed CN,T 1.9 1.0 Cu 4.5 2.7 Ni 4.1 2.6 Cr 7.0 4.0 Zn 4.2 2.6 Pb 0.6 0.4 Cd 1.2 0.7 Total metals 10.5 6.8 (d) Alternatively, the following mass-based standards are equivalent to and may apply in place of those limitations specified under paragraph (c) of this section upon prior agreement between a source subject to these standards and the publicly owned treatment works receiving such regulated wastes: Subpart G—Electroless Plating Facilities Discharging 38,000 Liters or More Per Day PSES Limitations (mg/sq m-operation) Pollutant or pollutant property Maximum for any 1 day Average of daily values for 4 consecutive monitoring days shall not exceed CN,T 74 39 Cu 176 105 Ni 160 100 Cr 273 156 Zn 164 102 Pb 23 16 Cd 47 29 Total metals 410 267 (e) For wastewater sources regulated under paragraph (c) of this section, the following optional control program may be elected by the source introducing treated process wastewater into a publicly owned treatment works with the concurrence of the control authority. These optional pollutant parameters are not eligible for allowance for removal achieved by the publicly owned treatment works under 40 CFR 403.7. In the absence of strong chelating agents, after reduction of hexavalent chromium wastes, and after neutralization using calcium oxide (or hydroxide) the following limitations shall apply: Subpart G—Electroless Plating Facilities Discharging 38,000 Liters or More Per Day PSES Limitations (mg/l) Pollutant or pollutant property Maximum for any 1 day Average of daily values for 4 consecutive monitoring days shall not exceed CN,T 1.9 1.0 Pb 0.6 0.4 Cd 1.2 0.7 TSS 20.0 13.4 pH ( 1 ( 1 1 (f) In addition to paragraphs (a) and (b) of this section, the following limitation shall apply for plants discharging less than 38,000 l (10,000 gal) per calendar day of electroplating process wastewater: Pollutant or pollutant property Maximum for any 1 day Milligrams per liter (mg/l) TTO 4.57 (g) In addition to paragraphs (a), (c), (d), and (e) of this section, the following limitation shall apply for plants discharging 38,000 l (10,000 gal) or more per calendar day of electroplating process wastewater: Pollutant or pollutant property Maximum for any 1 day Milligrams per liter (mg/l) TTO 2.13 (h) In addition to paragraphs (a), (b), (c), (d), (e), (f), and (g) of this section, the following shall apply: An existing source submitting a certification in lieu of monitoring pursuant to § 413.03 of this regulation must implement the toxic organic management plan approved by the control authority. (Secs. 301, 304, 306, 307, 308, and 501 of the Clean Water Act (the Federal Water Pollution Control Act Amendments of 1972, 33 U.S.C. 1251 et. seq., [46 FR 9467, Jan. 28, 1981, as amended at 48 FR 32484, July 15, 1983; 48 FR 43681, Sept. 26, 1983] Subpart H—Printed Circuit Board Subcategory § 413.80 Applicability: Description of the printed circuit board subcategory. The provisions of this subpart apply to the manufacture of printed circuit boards, including all manufacturing operations required or used to convert an insulating substrate to a finished printed circuit board. The provisions set forth in other subparts of this category are not applicable to the manufacture of printed circuit boards. § 413.81 Specialized definitions. For the purpose of this subpart: (a) The term sq ft (b) The term operation §§ 413.82-413.83 [Reserved] § 413.84 Pretreatment standards for existing sources. Except as provided in 40 CFR 403.7 and 403.13, any existing source subject to this subpart which introduces pollutants into a publicly owned treatment works must comply with 40 CFR part 403 and achieve the following pretreatment standards for existing sources (PSES): (a) No user introducing wastewater pollutants into a publicly owned treatment works under the provisions of this subpart shall augment the use of process wastewater or otherwise dilute the wastewater as a partial or total substitute for adequate treatment to achieve compliance with this standard. (b) For a source discharging less than 38,000 liters (10,000 gal) per calendar day of electroplating process wastewater the following limitations shall apply: Subpart H—Printed Circuit Board Facilities Discharging Less Than 38,000 Liters Per Day PSES Limitations (mg/l) Pollutant or pollutant property Maximum for any 1 day Average of daily values for 4 consecutive monitoring days shall not exceed CN, A 5.0 2.7 Pb 0.6 0.4 Cd 1.2 0.7 (c) For plants discharging 38,000 liters (10,000 gal) or more per calendar day of electroplating process wastewater the following limitations shall apply: Subpart H—Printed Circuit Board Facilities Discharging 38,000 Liters or More Per Day PSES Limitations (mg/l) Pollutant or pollutant property Maximum for any 1 day Average of daily values for 4 consecutive monitoring days shall not exceed CN, T 1.9 1.0 Cu 4.5 2.7 Ni 4.1 2.6 Cr 7.0 4.0 Zn 4.2 2.6 Pb 0.6 0.4 Cd 1.2 0.7 Total metals 10.5 6.8 (d) Alternatively, the following mass-based standards are equivalent to and may apply in place of those limitations specified under paragraph (c) of this section upon prior agreement between a source subject to these standards and the publicly owned treatment works receiving such regulated wastes: Subpart H—Printed Circuit Board Facilities Discharging 38,000 Liters or More Per Day PSES Limitations (mg/sq m-operation) Pollutant or pollutant property Maximum for any 1 day Average of daily values for 4 consecutive monitoring days shall not exceed CN, T 169 89 Cu 401 241 Ni 365 229 Cr 623 357 Zn 374 232 Pb 53 36 Cd 107 65 Total metals 935 609 (e) For wastewater sources regulated under paragraph (c) of this section, the following optional control program may be elected by the source introducing treated process wastewater into a publicly owned treatment works with the concurrence of the control authority. These optional pollutant parameters are not eligible for allowance for removal achieved by the publicly owned treatment works under 40 CFR 403.7. In the absence of strong chelating agents, after reduction of hexavalent chromium wastes, and after neutralization using calcium oxide (or hydroxide) the following limitations shall apply: Subpart H—Printed Circuit Board Facilities Discharging 38,000 Liters or More Per Day PSES Limitations (mg/l) Pollutant or pollutant property Maximum for any 1 day Average of daily values for 4 consecutive monitoring days shall not exceed CN, T 1.9 1.0 Pb 0.6 0.4 Cd 1.2 0.7 TSS 20.0 13.4 pH ( 1 ( 1 1 (f) In addition to paragraphs (a) and (b) the following limitation shall apply for plants discharging less than 38,000 l (10,000 gal) per calendar day of electroplating process wastewater: Pollutant or pollutant property Maximum for any 1 day Milligrams per liter (mg/l) TTO 4.57 (g) In addition to paragraphs (a), (c), (d), and (e) the following limitation shall apply for plants discharging 38,000 l (10,000 gal) or more per calendar day of electroplating process wastewater: Pollutant or pollutant property Maximum for any 1 day Milligrams per liter (mg/l) TTO 2.13 (h) In addition to paragraphs (a), (b), (c), (d), (e), (f), and (g) of this section, the following shall apply: An existing source submitting a certification in lieu of monitoring pursuant to § 413.03 of this regulation must implement the toxic organic management plan approved by the control authority. (Secs. 301, 304, 306, 307, 308, and 501 of the Clean Water Act (the Federal Water Pollution Control Act Amendments of 1972, 33 U.S.C. 1251 et. seq., [46 FR 9467, Jan. 28, 1981, as amended at 48 FR 32485, July 15, 1983; 48 FR 43681, Sept. 26, 1983]