Conceptio
›
Archive
›
Escholarship
Escholarship
metadata only
Study of shot noise in photoresists for extreme ultraviolet lithography through comparative analysis of line edge roughness in electron beam and extreme ultraviolet lithography
Bhattarai, Suchit et al.
Escholarship · Other
Open Source ↗
40 engineering (for-2020), 51 physical sciences (for-2020), 5104 condensed matter physics (for-2020)
This document is indexed with metadata only — full text is not available in the archive for this record.
Open the official source ↗
Related documents
Sliding Mode Wheel Slip Control for Regenerative Braking of an All-Wheel-Drive Electric Vehicle
#661873
Inverted Gaussian Process Optimization for Probabilistic Koopman Operator Discovery
#661874
Real-Time Forecasting of Intradialytic Hypotension Using Deep Learning and Multimodal Data Integration
#661876
Record
· ID 614637
Retrieved via
Conceptio
— every document is proof-bundled with source, license, and retrieval metadata.