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Impact of noise sources and optical design on defect detection sensitivity in extreme ultraviolet actinic pattern inspection tool

Wang, Yow-Gwo et al.
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signal
40 engineering (for-2020), 4009 electronics, sensors and digital hardware (for-2020), extreme ultraviolet actinic pattern inspection, extreme ultraviolet mask pattern defect, extreme ultraviolet lithography, optical design, signal-to-noise ratio
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