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Controlled Growth of Architectured Boron Nitride Films by Chemical Vapor Deposition in Model Microchannels

Alexandre Mounérat et al.
HAL (France) · Papers · License: Open Access
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Chemical vapor deposition, Nanoporous materials, High resolution transmission electron microscopy, Structural defects, Boron nitride nanowalls, Microchannel, 0, 1
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Record · ID 635170
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