Conceptio › Archive › HAL (France)
HAL (France)open access

Aerosol Assisted Plasma Processes: Role of the Liquid Precursor on Thin Film Deposition in a Low‐Pressure RF Capacitive Plasma

Michel Féron et al.
HAL (France) · Papers · License: Open Access
Open Source ↗
thin-films
Low-pressure RF plasma, Liquid aerosol, 0, Droplets, Thin films, 1, PECVD
This document is indexed with metadata only — full text is not available in the archive for this record. Open the official source ↗
Record · ID 677003
Retrieved via Conceptio — every document is proof-bundled with source, license, and retrieval metadata.