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Phenomenological Growth Regimes in Liquid-Precursor CVD of MoS$_2$ on Functional Substrates
The integration of two-dimensional transition-metal dichalcogenides (TMDCs) onto functional substrates remains constrained by stochastic vapor-phase growth dynamics. Here, we show that liquid-phase precursor chemical vapor deposition (CVD) of MoS$_2$ introduces growth conditions that are consistent
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