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Fabrication of optical nanodevices through field-emission scanning probe lithography and cryogenic etching
Sub-10 nanometer lithography is opening a new area for beyond-CMOS devices. Regarding to single nano-digit manufacturing we have established a new maskless patterning scheme by using field-emission, current controlled Scanning Probe Lithography (cc-SPL) in order to create optical nanodevices in thin
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