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Oxidation of Tantalum Nano-Film by Microwave Exposure
Oxidation and ablation of 200 nm tantalum films were carried out by three routes: (i) femtosecond (fs-)laser direct write, (ii) high-temperature annealing (HTA) in a tube furnace, and (iii) annealing in a 2.45 GHz microwave cavity. Complete conversion of the 200 nm Ta layer into 409 nm of Ta2O5 requ
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