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Measurement of the Critical Ionization Level for Resist Polymer Dissolution Using a Polypeptoid Platform

Paing, Aung et al.
eScholarship · Papers
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Reactive dissolution of a photoresist polymer in aqueous base to form a processable image is an important step in building patterns on semiconductor chips. The critical ionization (CI) theory states that a specific minimum fraction, the CI level, of the ionizable moieties in the exposed polymer is r
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