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Photoresist-Free Lithography via Light-Induced Redox Patterning of Oxide Thin Films
Lithographic patterning of nanoscale devices typically depends on photoresists, wet processing and multistep pattern-transfer workflows that impose both environmental and scaling constraints. Focused laser irradiation of (Ni,Co)1+2xTi1-xO3 under a reducing atmosphere drives localized oxygen removal,
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