arXiv (OAI Expanded)
open access
Stacking faults from a different angle - Overcoming the edge-on limit in high-resolution defect analysis
The nature of stacking faults (SF) - whether intrinsic or extrinsic - plays a pivotal role in defect-mediated processes in crystalline materials. Yet, transmission electron microscopy (TEM) techniques for their reliable analysis remain limited to either conventional fringe-contrast imaging of inclin
Conceptio Open Archive
Analyze & explore related research in Conceptio
Connect this record directly into your research workflow or AI agent. Explore citations across open repositories, query full text, and export structured proof bundles.
This document is indexed with metadata only: full text is not available in the archive for this record. Open the official source ↗
Related documents
- Achieving 5-angstrom-resolution diffraction contrast with an uncorrected electron probe and nanosized defect characterizations#1064640
- New insights into the kinematics of fault-propagation folding from analogue models monitored using particle image velocimetry.#1001984
- Self‐Assembly of Bent‐Core Nematics in Nanopores#354109
- Molecular tags for electron cryo-tomography#376067
- Accelerating electron diffraction analysis using graph neural networks and attention mechanisms#624294
Record · ID 1084027
Retrieved via Conceptio: every document is proof-bundled with source, license, and retrieval metadata.
Retrieved via Conceptio: every document is proof-bundled with source, license, and retrieval metadata.
Bring this data into your agent: Connect via MCP or API · 20 free credits to start · no card required
Read the Docs → · View CLI source on GitHub · Conceptio Open Knowledge Archive
Read the Docs → · View CLI source on GitHub · Conceptio Open Knowledge Archive