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Defect-controlled electrical and optical properties of CrN thin films: experiment and first-principles study
Thin chromium nitride (CrN) films were deposited by RF magnetron sputtering in a reactive atmosphere of Ar-N$_2$ on fused silica and MgO (001) substrates at temperatures between 400 $^o$C and 800 $^o$C. The influence of nitrogen content and substrate temperature on structural, electrical, and optica
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