HAL (France)
open access
Stress-driven photo-reconfiguration of surface microstructures via vectorial field-guided lithography
Conceptio Open Archive
Analyze & explore related research in Conceptio
Connect this record directly into your research workflow or AI agent. Explore citations across open repositories, query full text, and export structured proof bundles.
This document is indexed with metadata only: full text is not available in the archive for this record. Open the official source ↗
Related documents
- Fabrication of optical nanodevices through field-emission scanning probe lithography and cryogenic etching#955392
- Controlling Polystyrene Particle Distribution in Colloidal Lithography For Correlated‐Disorder Structures#1158286
- Polymer-based capacitors, junction field -effect transistors, and a follower circuit by lithography, self -assembly, and ink -jet printing techniques#958212
- RETRACTED: Innovative mix design of lightweight porcelainised matrix for building comfort: pore - network and microstructures#291741
- Optically Responsive Field-Effect Transistors Based on Graphene/Diarylethene Hybrid Films#471870
Record · ID 1266254
Retrieved via Conceptio: every document is proof-bundled with source, license, and retrieval metadata.
Retrieved via Conceptio: every document is proof-bundled with source, license, and retrieval metadata.
Bring this data into your agent: Connect via MCP or API · 20 free credits to start · no card required
Read the Docs → · View CLI source on GitHub · Conceptio Open Knowledge Archive
Read the Docs → · View CLI source on GitHub · Conceptio Open Knowledge Archive