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From All-Si Nanowire TFETs Towards III-V TFETs

Ghoneim, Hesham · 2012
DataCite · Datasets · 2012
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doping
Performance improvement by device scaling has been the prevailing method in the semiconductor industry over the past four decades. However, current silicon transistor technology is approaching a fundamental limit where scaling does not improve device performance. As the density of number of devices
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