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Modification of optical properties in ultrathin ALD-grown NbN layers using oxygen plasma treatment
NbN thin films with a nominal thickness of 10 nm were grown by atomic layer deposition (ALD) on Al$_2$O$_3$-buffered Si substrates and treated with oxygen plasma for 0 s (untreated), 20 s, 40 s, and 60 s to investigate oxygen-induced changes in their optical properties. Spectroscopic ellipsometry (S
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