Caltechdatametadata only
Materials Experiment and Analysis Database: Electrochemistry analysis in which 0 sub-analyses are performed on plate(s) containing Cu,Fe,V,Ar,O annealed at 550.0C to add O on 2018-07-12 from Analysis 20180712.121616
caltech hte analysis, cu, fe, o, v, oxide
This document is indexed with metadata only — full text is not available in the archive for this record.
Open the official source ↗
Related documents
- Materials Experiment and Analysis Database: Inkjet chemical deposition analysis in which 0 sub-analyses are performed on plate(s) containing Ni,Fe,Cu,Mn,Co,Ta annealed at 700.0C to add O on 2016-10-25 from Analysis 20161024.171100#660967
- Materials Experiment and Analysis Database: X-ray diffraction measurements 2 files performed on plate containing W,Fe,Ar annealed at 610.0C to add O on 2018-02-28 from Run 20180228.220415#657725
- Materials Experiment and Analysis Database: X-ray diffraction measurements containing 9 files performed on plate containing Fe,Zn,Ar,O annealed at 550.0C to add O on 2014-08-05 from Run 20140805.130628#660961
- Materials Experiment and Analysis Database: Material library with Cu,V,V deposited by INKJET on 2014-08-25 from Plate 00021058 annealed at 560.0C to add O on 2015-09-22#660962
- Materials Experiment and Analysis Database: Inkjet chemical deposition measurements collected from 1 run(s) performed on plate(s) containing Sn,Fe,Cu,Mn,Co,Ta annealed at 400.0C to add O on 2017-03-01 from Experiment 20170301.102900#660963
Record · ID 294030
Conceptio Open Knowledge Archive — every document is proof-bundled with source, license, and retrieval metadata.