DataCite
metadata only
Physico-chemical study of the focused electron beam induced deposition process
Conceptio Open Archive
Analyze & explore related research in Conceptio
Connect this record directly into your research workflow or AI agent. Explore citations across open repositories, query full text, and export structured proof bundles.
This document is indexed with metadata only: full text is not available in the archive for this record. Open the official source ↗
Related documents
- Extended hot-electron model and current bistability in insulating <math><mrow><mi>a</mi><mtext>-</mtext><msub><mi mathvariant="normal">Y</mi><mi>x</mi></msub><msub><mi>Si</mi><mrow><mn>1</mn><mtext>-</mtext><mi>x</mi></mrow></msub></mrow></math> films#330322
- Phenomenology of orbital torque, pumping, and mixing conductance in metallic bilayers#274167
- Materials Experiment and Analysis Database: Inkjet chemical deposition measurements collected from 1 run(s) performed on plate(s) containing Mn,Co,Ta,Sb,Co annealed at 450.0C to add O on 2014-03-25 from Experiment 20140324.170300#1056852
- Study of shot noise in photoresists for extreme ultraviolet lithography through comparative analysis of line edge roughness in electron beam and extreme ultraviolet lithography#614637
- Materials Experiment and Analysis Database: Inkjet chemical deposition measurements collected from 1 run(s) performed on plate(s) containing Sn,Zn,Mn,Mg,Co,Ca annealed at 400.0C to add O on 2017-03-08 from Experiment 20170308.104100#1044077
Record · ID 456735
Retrieved via Conceptio: every document is proof-bundled with source, license, and retrieval metadata.
Retrieved via Conceptio: every document is proof-bundled with source, license, and retrieval metadata.
Bring this data into your agent: Connect via MCP or API · 20 free credits to start · no card required
Read the Docs → · View CLI source on GitHub · Conceptio Open Knowledge Archive
Read the Docs → · View CLI source on GitHub · Conceptio Open Knowledge Archive