First Demonstration of Flip DRAM from Process, Architecture to System to Push DRAM Scaling beyond 4F2: 2F2 Self-aligned Flip Vertical Channel Transistor (FVCT) DRAM and Flip WL (FWL) 3D-DRAM

For the first time, we proposed a novel stacking technology for DRAM scaling by flipping and backside processes, making full use of DRAM wafer's backside and investigating it on both 4F2 and 3D-DRAM. For 4F2 VCT, 2F2 Flip VCT featuring self-aligned back-to-back stacked 1T1C bitcell, with various BL