HAL (France)
open access
TiN films deposited by low-temperature magnetron sputtering on polyethylene to improve its hydrophobicity and hardness
Titanium nitride films were deposited on ultra-high molecular weight polyethylene and silicon substrates by magnetron sputtering at room temperature. A design of experiments (DoE) was set up to study the influence of seven sputtering parameters on the properties of the thin films: TiN target
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